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Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
2021
Chun Yi Chou
Wei-Hao Lee
Chih-Piao Chuu
Tse-An Chen
Cheng-Hung Hou
Yu-Tung Yin
Ting-Yun Wang
Jing-Jong Shyue
Lain-Jong Li
Miin-Jang Chen
Keywords:
Nitride
Chemical engineering
Materials science
layer
Nucleation
Atomic layer deposition
Oxide
Correction
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