Development of a large-area, multi-helicon rectangular plasma source for TFT-LCD processing

Abstract A large-area multi-helicon rectangular plasma source has been designed and fabricated using twelve side-injected helicon plasma injectors for flat panel display processing. In order to get the optimum design parameters for helicon plasma injectors, very high frequency discharge using m =1 Nagoya type III antenna appears to be the best for high-density plasma generation. Magnetic field effects on both plasma generation and transport are studied. Maximum plasma densities have been obtained at low magnetic fields near 100–150 G, and the uniformity of plasma density has been optimized by the magnetic field configuration and the substrate level.