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Gate Workfunction Engineering for Deep Submicron CMOS
Gate Workfunction Engineering for Deep Submicron CMOS
1999
C.J.J. Dachs
Y.V. Ponomarev
P.A. Stolk
A.H. Montree
Keywords:
Materials science
Electronic engineering
CMOS
Electrical engineering
Short-channel effect
Boron
inorganic materials
semiconductor materials
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