Chemical vapor deposition in fluidized bed reactors

Abstract The intrinsic high rates of heat and mass transfer of fluidized bed reactors can be used to significantly expand applications for chemical vapor deposition. This paper illustrates some of the uses of fluidized bed reactors for depositing homogeneous coatings by chemical vapor deposition. Conventional approaches to coating particles and new developments for coating large substrates are presented. The use of subhalide chemistry for coating at low temperatures is also described.