Downscaling ULSIs by using nanoscale engineering

Growing evidence suggests that the fundamental limits of the MOSFET are well below 0.1 @mm. However, solving problems involved in building Ultra-Large-Scale Integrated circuits (ULSIs) from MOSFETs with ultimate sizes below the cutting-edge at 0.25 @mm will become an increasingly uphill effort. Further downscaling of the ULSI is a great challenge both technologically and economically. Breakthroughs are badly needed, especially in patterning technology. The ULSI has so far been repeatedly refuelled by the right innovation at the right time. There is a strong possibility that the next breakthrough will come from what is now referred to as nanotechnology.