Deep UV projection photoetching objective lens

DUV lithography projection objective, comprising an outer sealing thermostatic jacket, an inner layer and the intermediate layer structure, the intermediate layer is a tube, connected to each other by a first barrel and a second barrel member connected with the inner layer is ten the optical lens element and ten separate fixed optical lens element of the lens frame assembly, an optical system consisting of ten optical lens element is a double-telecentric system, between ten optical lens element is provided with inner reinforcing assembly resolution, resolution enhanced force component ten optical lens elements into two groups before and after the objective lens, the objective lens of the front group of the first to fourth lenses, the objective lens of the rear group composed of the fifth to tenth lens, an optical resolution column enhance both the front face assembly group object side focal plane of the objective lens of the image side focal plane, the objective lens of the rear group is also the pupil plane of the optical system. The present invention has the ability to enhance the resolution, to overcome the existing lithography projection objective can only be achieved lithography resolution limits of conventional optical resolution is insufficient, and also having a simple structure, low cost, large optical reduction ratio, significantly reducing the manufacturing ultrafine mask the difficulty of features, making it able to produce higher resolution graphics fine.