Radiation source, apparatus and method for rapid heat treatment of coatings

The invention relates to a radiation source, a device and a method for rapid heat treatment of a coating on a substrate in a vacuum chamber of a substrate treatment plant, in which the coating is irradiated by a radiation source and rapidly heated by irradiation. In order to achieve a short-term heat treatment which acts over a large area, close to the surface and independent of the degree of absorption of the coating, an electron radiation source comprising at least one flashlamp and one electron emission layer is used according to the invention. In this case, the coating is irradiated with electrons which are emitted by the flash lamp from the electron emission layer.