A large area polymer-based substrate with broadband absorption for surface enhanced Raman scattering

We fabricate a large area (3 × 3 cm 2 ) polydimethylsiloxane-based substrate for surface-enhanced Raman scattering by combining femtosecond laser microstructuring and soft lithography techniques. The substrate exhibits broadband absorption in the region of 350–1000 nm and reproducible enhancement factor ∼10 7 .