Old Web
English
Sign In
Acemap
>
Paper
>
Characterization of silicon surface implanted by nitrogen ion beam from plasma focus device
Characterization of silicon surface implanted by nitrogen ion beam from plasma focus device
2019
M Ahmad
Sh. Al Hawat
M. Akel
Keywords:
Dense plasma focus
Nitrogen
Optoelectronics
Ion beam
Silicon
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
27
References
0
Citations
NaN
KQI
[]