MODELING OF CHEMICAL VAPOR DEPOSITION: MESO- AND MICROSCALE MODELS

In this paper we present modeling and simulation of chemical vapor deposition (CVD) on metallic bipolar plates. We discuss the application of different models to simulate the plasmatransport of chemical reactants in the gas chamber. We take into account one-dimensional models that are treated analytically under some assumptions and multi-dimensional models that are solved numerically with software packages. Due to the multi-scaling nature of the physical behavior, we discuss adapted models in different domains and scales. The near- and far-field contexts are based on large scales that are treated with continuous models, e.g. convectiondiffusion-reaction equations. And small scales that are based on chemical and molecular models, e.g. Boltzmann-equations. The results are discussed with physical experiments to give valid models for the assumed growth of thin layers.