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Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
2019
Anette Löfstrand
Dmitry Suyatin
Nicklas Nilsson
Issei Otsuka
Anders Kvennefors
Johan Ring
Redouane Borsali
Ivan Maximov
Keywords:
Lithography
Infiltration (hydrology)
Chemical engineering
Styrene
Copolymer
Materials science
Correction
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