Effect of impurities on the oxidation mechanism of nickel at 800°C

The effect of impurities on the oxidation mechanism of nickel was studied on commercial nickel grades compared to a pure nickel. On the basis of oxidation kinetics, SEM and STEM microstructural and analytical investigations allowed us to identify the oxidation mechanism for both types of nickel at 800°C. The morphology of the oxide scale notably differs according to the purity of the nickel. For oxidised commercial grades, a duplex structure was observed with an outer columnar layer and an inner layer made of equiaxed grains. The inner NiO/outer NiO interface is planar without any segregation, while the NiO/Ni interface is convoluted with large cavities. Mn, Ti and sometimes also silicon impurities were detected at this latter interface. Below the NiO/Ni interface, in the underlying nickel, large internal oxidation was observed. The observed microstructure was quite different for the pure nickel. A single porous NiO layer, composed of equiaxed grains, was observed. The NiO/Ni interface was facetted and no...