Chemical-mechanical polishing machine and polishing assembly for chemical-mechanical polishing machine

The invention discloses a chemical-mechanical polishing machine and a polishing assembly for the chemical-mechanical polishing machine. The polishing assembly comprises a lower support, an upper support, a driving rotating tower and two polishing head assemblies. A worktable and a polishing disc are arranged on the lower support; the upper support is erected on the lower support; the driving rotating tower is suspended on the upper support, and at least one part of the driving rotating tower can rotate in a pivoted mode relative to the lower support; and the two polishing head assemblies are installed on the driving rotating tower and can move between a loading and unloading position corresponding to the worktable position and a polishing position corresponding to the polishing disc position under pivot rotation of the driving rotating tower, wherein when one polishing head assembly is located at the loading and unloading position, the other polishing head assembly is located at the polishing position. According to the polishing assembly for the chemical-mechanical polishing machine, while one polishing head assembly polishes, the other polishing head assembly can load and unload wafers, and the two polishing head assemblies can polish alternately so that continuous working can be conducted, and accordingly working efficiency can be improved.