Precision depth profiling of nanoelectronic structures using secondary molecular ions in secondary-ion mass spectrometry

A method for improving SIMS depth profiling by recording secondary molecular ions is proposed. Experimental studies of SiGe and AlGaAs nanometer-scale test structures, and of boron-doped Si with an energy of 5 keV showed improved secondary-ion mass spectroscopy depth resolution when recording secondary molecular ions. A physical model that considers the molecular ion dissociation energy to be a decisive parameter is discussed.