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Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography
Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography
2019
Madeleine Nilsen
Fabian Port
Michael Roos
Kay-Eberhard Gottschalk
Steffen Strehle
Keywords:
Materials science
Silicon nitride
Analytical chemistry
Photoresist
Lithography
Beam (structure)
Nanotechnology
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