Dependence of structural and electrical properties of AlGaN/GaN HEMT on Si(111) on buffer growth conditions by MBE

Multiple AlGaN/GaN heterostructure has been grown on Si(111) substrate by molecular beam epitaxy with different buffer growth conditions. Its influence on physical and electrical properties of two-dimensional electron gas (2DEG) has been investigated. Correlation between growth temperature variation in AlN intermediate layer and thick GaN buffer layer on 2DEG transport property has been observed. Besides the variation in growth temperatures, dissimilar partial doping in the thick GaN buffer has also been studied. Impact of different silicon substrate doping has been examined to inspect the electrical properties of high electron mobility transistors (HEMT). DC characteristics of large area fabricated HEMT have been compared in terms of current, transconductance, and linearity for power amplifier applications.