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Light Emitting Properties of Si-Rich-Si3N4 Films Grown By PECVD Method
Light Emitting Properties of Si-Rich-Si3N4 Films Grown By PECVD Method
2015
T. V. Torchynska
Jose Luis Casas Espinola
G. Polupan
Erasto Vergara Hernandez
L. Khomenkova
A. Slaoui
Keywords:
Optoelectronics
Engineering drawing
Plasma-enhanced chemical vapor deposition
Engineering
Engineering physics
Correction
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