The vacuum vapor deposition using a vacuum deposition source and a source of vacuum deposition method

The present invention provides a vacuum vapor deposition source, comprising an inner crucible accommodating a vapor deposition material, the crucible comprises a crucible body having a first opening and a second opening having an upper portion of the crucible, the diameter of the second opening is smaller than the first an opening; a surface of the vapor deposition material is heated above the heater by means of radiation heat, the upper portion above the heater disposed outside of the crucible and away from the second opening position; for reflection above said heater radiant heat energy generated by the reflector, the reflector is provided outside the heater above and away from the second opening position. The present invention also provides a vacuum vapor deposition method using the vacuum vapor deposition source. Vacuum deposition method and the vapor deposition source of the present invention can improve the stability of the film during vacuum coating.