MEMS microphone and manufacturing method therefor

The invention provides an MEMS microphone and a manufacturing method therefor. The method comprises the steps: providing a semiconductor substrate; forming a bottom electrode and an interconnection electrode located at the periphery of the bottom electrode; forming a first sacrificial layer which covers the bottom electrode, a part of the interconnection electrode, and the exposed semiconductor substrate; forming a diaphragm electrode; forming a second sacrificial layer on the first sacrificial layer and the diaphragm electrode; forming a dielectric layer; etching a no-device partition region from the back of the semiconductor substrate, and forming a bottom air guide hole exposing the first sacrificial layer; etching the dielectric layer, and forming a top air guide hole on the surface of the dielectric layer; and removing the first and second sacrificial layers through the bottom air guide hole and the top air guide hole. The microphone is formed on a side surface of the semiconductor substrate, and the manufacturing method is compatible with the CMOS technology, is easy for the micro-shrink of a device, and is integrated in a semiconductor chip.