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Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications
Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications
2021
K. Naveen Kumar
Habibuddin Shaik
Amulya Pawar
L.N. Chandrashekar
Sheik Abdul Sattar
G Nithya
R. Imran Jafri
V. Madhavi
Jyothi Gupta
G. Ashok Reddy
Keywords:
Partial pressure
Electrochromism
Optoelectronics
Materials science
Thin film
annealing
Correction
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