An optical system, in particular the projection exposure system of microlithography

An optical system, in particular for projection exposure apparatus of microlithography, in particular with slit-shaped image field or non-rotationally symmetric illumination, an optical element 1, in particular a lens or a mirror disposed in a holder 7 or an inner ring 2, and actuators 8a , 8b and 9a, 9b. In order to generate tensile and / or compressive forces, a plurality of actuators 13 8b and 9a, 9b engage the deformable inner ring 2 8a via a radial force-translation 12 at.