Method for determining temperature distortion correcting parameter of lens array system apparatus

The invention provides a method for determining corrected parameters for the thermal deformation of a battery of lenses system device. The method is suitable for the exposure of a plurality of wafers. The method comprises the following steps: a. selecting different corrected parameters for thermal deformation of the battery of lenses assembly system device in a predetermined region; b. obtaining the amplification parameters of a relevant mask according to the selected different corrected parameters for thermal deformation of the battery of lenses system device; and c. selecting the corrected parameter for thermal deformation of the battery of lenses system device where the mask amplification parameters change little with the increase in quantity of the exposed wafers, and using the selected correction parameter as the optimal correction parameter for thermal deformation of the lens assembly system device. Compared with prior art, the invention can accurately select the optimal correction parameter for thermal deformation of the lens assembly system device. Additionally, the different kinds of wafers can obtain the corrected parameters for thermal deformation of the relevant battery of lenses system device during different manufacturing processes.