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Optical Etch‐Rate Monitoring Using Active Device Areas: Lateral Interference Effects
Optical Etch‐Rate Monitoring Using Active Device Areas: Lateral Interference Effects
1985
P. A. Heimann
Keywords:
Interference (wave propagation)
Isotropic etching
Solid-state
Analytical chemistry
Inorganic chemistry
Reaction rate
Chemistry
Engraving
Nanotechnology
active devices
Process control
Correction
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