Synthesis and Electronic Properties of Th-N Films.

Abstract Thin layers of Th, ThN, and Th 3 N 4 were synthesized by sputter deposition of Th in an Ar atmosphere with variable nitrogen partial pressure. The phase purity and crystal structure of the nitrides were confirmed by X-ray diffraction. Photoelectron spectroscopy studies demonstrate that ThN is metallic, with a rather high density of 6d states at the Fermi level, while Th 3 N 4 is non-metallic.