Smart Cut™ technology provides excellent layer uniformity for fully depleted CMOS
2013
Now that silicon product results are becoming available, and that the FD-SOI substrates hit the required uniformity to enable such products. It can now be said that Planar FDSOI is a credible manufacturing technology at 28nm. Furthermore, the technology is in place and has been proven to enable further scaling to at least the 10nm node.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI