Permanent mask resist photosensitive resin composition, a manufacturing method of a photosensitive element, resist pattern forming method and printed wiring board

The present invention and (A) acid-modified vinyl group-containing epoxy resin contains (B) a photopolymerization initiator and a (C) nitroxyl compounds, (C) nitroxyl compound, including a compound having a specific structure providing a permanent mask resist photosensitive resin composition.