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Dependable Integration of Full-Porous Low-k Interconnect and Low-leakage/ Low-cost Transistor for 45nm LSTP Platform
Dependable Integration of Full-Porous Low-k Interconnect and Low-leakage/ Low-cost Transistor for 45nm LSTP Platform
2007
Kazuo Sukegawa
Toshiaki Yamamoto
Hiroshi Kudo
Tomohiro Kubo
T. Sukegawa
H. Ehara
H. Ochmizu
Masafumi Fukuda
Y. Mizushima
Yoshiyuki Shimoda
M Tajima
M. Oryoji
Yoshihiro Kawasaki Nakata
Hirofumi Watatani
H. Sakai
A. Asneil
Shoko Sakai
H. Matsuyama
Hiroyuki Kurata
Atsuhiro Tsukune
N. Shimrzu
Shinichi Satoh
Masataka Kase
Toshihiro Sugii
Keywords:
Interconnection
Transistor
Leakage (electronics)
Optoelectronics
Porosity
Materials science
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