Ultraviolet or deep ultraviolet laser light sources emitting a high spatial resolution electron microscopy

The present invention relates to use of external ultraviolet or deep ultraviolet laser light sources of high spatial resolution light emission electron microscope, comprising an ultraviolet or deep ultraviolet laser, light-emitting laser external electron microscope PEEM, ultraviolet or deep ultraviolet laser emitted from the optical path perpendicularly incident to the sample stage PEEM is. The energy that is higher than a fixed wavelength or continuous wavelength 5eV (deep) ultraviolet light emitting laser light applied to the electron microscope; by a laser system with a laser PEEM connected in a unique manner perpendicular to the sample surface of the solid surface photoelectrons incident excitation; using electron optical system surface of the light-emitting electronic imaging to obtain a surface image information; dynamic process on solid surface application deep ultraviolet laser, including surface chemistry and surface growth, to realize the surface dynamics of a high spatial resolution, in-situ real-time studies and Observed.