Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups

2011 
We synthesized Noria analogs (Noria-OEt) with 12 ethoxy groups and 12 hydroxy groups by the condensation reaction of 3-ethoxyphenol with 1,5-pentanedial in high yield and prepared negative-type photoresist composed of Noria-OEt, crosslinker, photoacid generator and quencher. The negative-working photoresist gave a resolution pattern of 35-nm half-pitch with high sensitivity (10.0 mJ cm−2) by an extreme ultraviolet (EUV) lithography system.
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