A novel technique for the fabrication of sub-20nm metallic wires

Abstract Continuos metallic wires ∼10nm in width have been fabricated. These have been achieved using a new technique which exploits the ability to form ultra fine trenches in the surface of a SiO 2 layer using the irradiated SiO 2 process. The complete process is described along with simulations of the process which enable the process to be optimised.