Y-Ba-Cu-O Superconducting Thin Films Deposited by Rapid Isothermal Processing MOCVD

As a reduced thermal budget processing technique, we have used rapid isothermal processing MOCVD for the deposition of Y-Ba-Cu-O (YBCO) films. For further reducing the thermal budget, we have integrated remote plasma and RIP in one chamber. The results presented here, coupled with our capability of depositing YBCO on BaF2/Si substrate, indicate the usefulness of MOCVD for the practical realization of superconductor/semiconductor hybrid and other advanced devices.