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Characteristics of N2 and O2 Plasma‐Induced Damages on AlGaN Thin Film Surfaces
Characteristics of N2 and O2 Plasma‐Induced Damages on AlGaN Thin Film Surfaces
2017
Retsuo Kawakami
Masahito Niibe
Yoshitaka Nakano
Ryo Tanaka
Chisato Azuma
Takashi Mukai
Keywords:
Damages
Thin film
Physics
Nuclear magnetic resonance
Plasma
o2 plasma
Condensed matter physics
Correction
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