Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

A magnetron sputtering discharge with a positively biased anode in argon gas is investigated by Langmuir probe diagnostics and by energy-resolved mass spectrometry. The discharge is operated in continuous (direct current) and in pulsed (high power impulse magnetron sputtering, Hi) mode with a Ti target and in Ar gas. Singly-charged Ar +, Ti +, and Ar 2 + and doubly-charged Ar 2 + and Ti 2 + ions are observed. A novel approach is to bias the magnetron anode. Application of a positive anode voltage shifts the kinetic energies of plasma ions by q e 0 V a, where V a is the anode voltage and q e 0 is the ion charge. It allows for an effective control of plasma ion energies.