Radiation source device and method for rapid heat treatment of coatings

The invention relates to a radiation source, a device and a method for rapid heat treatment of a coating on a substrate in a vacuum chamber of a substrate processing system, in which the coating is irradiated by a radiation source and heated rapidly by irradiation. In order to achieve a short-time heat treatment, acting over a large area, the surface and independent of the degree of absorption of the coating, an electron radiation source is used according to the invention, comprising at least one flash lamp, and an electron emission layer. The coating is irradiated with electrons emitted by the flash lamp from the electron emission layer.