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NiSi/SiO_2界面近傍の化学結合状態およびNiSi層の実効仕事関数評価(ゲート絶縁膜,容量膜,機能膜及びメモリ技術)
NiSi/SiO_2界面近傍の化学結合状態およびNiSi層の実効仕事関数評価(ゲート絶縁膜,容量膜,機能膜及びメモリ技術)
2006
hirosi miti yosinaga
daisuke higasi
hideki murakami
teruo oota
yuuki munetaka
seiitirou higasi
seiiti miyazaki
takasi sati aoyama
kimihiko hosaka
kentarou sibahara
Keywords:
Machine learning
Artificial intelligence
Computer science
Pattern recognition
Correction
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