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Acemap > Paper > NiSi/SiO_2界面近傍の化学結合状態およびNiSi層の実効仕事関数評価(ゲート絶縁膜,容量膜,機能膜及びメモリ技術)

NiSi/SiO_2界面近傍の化学結合状態およびNiSi層の実効仕事関数評価(ゲート絶縁膜,容量膜,機能膜及びメモリ技術)

2006 
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