Simple technologies for fabrication of low-loss silica waveguides
1992
A simple and reproducible technology is developed for the fabrication of low-loss silica waveguides on silicon substrates. The guiding layer is formed by changing the Si-O ratio composition of the SiO/sub 2/ layer. The waveguides can be made to have a good match to either optical fibres or guided-wave devices in III-V compound semiconductors.
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