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MIS and MFIS Devices: DyScO$_{3 }$ as a gate-oxide and buffer-layer
MIS and MFIS Devices: DyScO$_{3 }$ as a gate-oxide and buffer-layer
2008
R. Melgarejo
N.K. Karan
Jose J. Saavedra-Arias
Dillip K. Pradhan
Reji Thomas
Ram S. Katiyar
Keywords:
Gate oxide
Non-volatile memory
Electronic engineering
Materials science
Optoelectronics
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