Projection exposure method and its equipment

PURPOSE: To prevent thermal deformation in time of an optical system for a long time, when a pattern on a mask is subjected to reduction transfer on a wafer, via a reflection type reduction projection optical system, by using a beam in an X-ray region or a vacuum ultraviolet region as an exposure light. CONSTITUTION: The following are installed; a means 32 for cooling the rear of a multilayered film mirror constituting a projection optical system, and a heating means 31 which controls heat amount so as to make energy absorbed by the multilayered film mirror always constant. COPYRIGHT: (C)1993,JPO&Japio