Spectroscopic Study of Overstrained Chemical Bonds in Polymers at Photomechanical Processes

Abstract The presence of overstrained chemical bonds in mechanically strained polymers, found in papers /1,2/ has promoted clearing up of polymer destruction mechanism under the action of mechanical tension. At the same time the contribution of these bonds in photomechanical processes(simultaneous action of UV-radiation and mechanical loading) still remains not clear. Though, in phenomenological notion UV radiation influence and other outer factors on kinetics of strained polymer destruction have been studied and generalized in papers /3-5/.