Pellicle frame apparatus, a mask, an exposure method and a manufacturing method for an exposure apparatus and device

Pellicle is provided on one side of the end surface of the frame (F) (Fa). On the other side of the frame (F) has a region opposed to the substrate (R). Configured such that the shape of the facing region of one side of the deformation and the other side of the frame (F) to prevent the influence each other.