Rapid microcantilever-thickness determination by optical interferometry

Silicon microcantilevers are widely used in scanning-probe microscopy and in cantilever-sensing applications. However, the cantilever thickness is not well controlled in conventional lithography and, since it is also difficult to measure, it is the most important undefined factor in mechanical variability. An accurate method to measure this parameter is thus essential. We demonstrate the capability to measure microcantilever thicknesses rapidly (>1 Hz) and accurately (±2 nm) by optical interferometry. This is achieved with standard microscopy equipment and so can be implemented as a standard technique in both research and in batch control for commercial microfabrication. In addition, we show how spatial variations in the thickness of individual microcantilevers can be mapped, which has applications in the precise mechanical calibration of cantilevers for force spectroscopy.