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Application of N2/Ar inductively coupled plasma → the photoresist ashing for low-k dielectrics
Application of N2/Ar inductively coupled plasma → the photoresist ashing for low-k dielectrics
2005
Hyoun Woo Kim
Ju Hyun Myung
Nam Ho Kim
Chung-Gon Yoo
Kee Won Suh
S. Kim
Dae-Kyu Choi
Chin-Wook Chung
Chang Jin Kang
Wan-jae Park
Se-Geun Park
Jaegab Lee
Keywords:
Ashing
Dielectric
Photoresist
Low-k dielectric
Photolithography
Inductively coupled plasma
Materials science
Analytical chemistry
Solid mechanics
Correction
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