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Reduction of Defects after Poly Si CMP with Oxide Slurry
Reduction of Defects after Poly Si CMP with Oxide Slurry
2006
Seong Kyu Yun
Sang-Yeob Han
Jae-dong Lee
Yi-Koan Hong
Jin-Goo Park
Bo Un Yun
Chang Ki Hong
Han-Ku Cho
Joo-Tae Moon
Keywords:
Oxide
Slurry
Inorganic chemistry
Materials science
Chemical engineering
Correction
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