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Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition of SiCxNyOzFilm Using Monomethylsilane, Nitrogen and Argon
Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition of SiCxNyOzFilm Using Monomethylsilane, Nitrogen and Argon
2017
Mai Hong Minh
Toru Watanabe
Kohei Shioda
Hitoshi Habuka
Keywords:
Nitrogen
Inorganic chemistry
Argon
Chemistry
Plasma-enhanced chemical vapor deposition
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