The optical element

The invention relates to an optical element for a projection exposure system for semiconductor lithography having an optically active surface (9) and at least one cooling component for cooling the optical element, wherein the cooling component is connected to at least two separate cooling circuits and formed in such a way that the optically active surface (9) can be cooled more in at least a partial region than in a further section. Further, the invention relates to a projection exposure apparatus with an inventive optical element.