Exposure apparatus and exposure method

An apparatus and method for exposing an exposure, the exposure apparatus comprising: a base; wafer stage group, the wafer stage group includes a plurality of wafer stage, wafer stage plurality of sequentially movable between a first position and a second position on a base cycle; alignment detection means, for aligning the wafer; onboard a mask stage for loading cylindrical reticle, and the circle cylindrical mask plate around the central axis; optical projection unit projected onto the exposure region of the wafer wafer stage light transmitted through the cylindrical mask plate; when the wafer stage moves from a first position to a second position, and the scan direction along a single scanning direction, the cylindrical mask plate around the central axis of rotation, projected onto the wafer through the wafer stage cylindrical light mask plate, for a column along the scanning direction on the exposure region of the wafer arrangement is exposed. When the exposure, the wafer stage does not need to change the scanning direction, which saves the exposure time and improve efficiency of the exposure.