Manufacturing method of display substrate and display substrate

The invention discloses a manufacturing method of a display substrate and the display substrate. The manufacturing method of the display substrate includes the following steps: forming an active-layer pattern above the underlayer substrate; forming a grid electrode above the active-layer pattern; carrying out light dope on the active-layer pattern so as to form lightly-dope areas and a polycrystalline silicon area, wherein the lightly-doped areas are located at the two sides of the grid electrode and the polycrystalline silicon area is located below the grid electrode; through first via holes formed above the lightly-doped areas, carrying out heavy dope on the lightly-doped areas so as to form heavily-doped areas and lightly-doped drain areas, wherein the lightly-doped drain areas are located between the heavily-doped areas and the polycrystalline silicon area; and forming source and drain electrode patterns above the heavily-doped areas, wherein the source and drain electrode patterns are connected with the heavily doped areas through the first via holes. The manufacturing method of the display substrate and the display substrate improve the uniformity of the lengths of the lightly-doped areas on the display substrate and improve the doping efficiency.