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Application of N 2 /Ar inductively coupled plasma ? the photoresist ashing for low- k
Application of N 2 /Ar inductively coupled plasma ? the photoresist ashing for low- k
2005
Hyoun Woo Kim
Ju Hyun Myung
Nam Ho Kim
Chung-Gon Yoo
Kee Won Suh
S. Kim
Dae-Kyu Choi
Chin-Wook Chung
Chang Jin Kang
Wan-jae Park
Se-Geun Park
Jaegab Lee
Keywords:
Materials science
Metallurgy
Ashing
Analytical chemistry
Inductively coupled plasma
Photoresist
Correction
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