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Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced gate Stack Engineering
Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced gate Stack Engineering
2002
Ana R. Londergan
Sasangan Ramanathan
Kim Vu
Stefano Rassiga
Ronald Hiznay
Jereld Winkler
Hector Velasco
Lawrence Matthysse
Thomas E. Seidel
C.H. Ang
Keywords:
High-κ dielectric
Atomic layer deposition
Process optimization
Electronic engineering
Materials science
Engineering physics
gate stack
Nanotechnology
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