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Charging of Underlayer at Via Etch causing Slow Down in Oxide Etch Rate
Charging of Underlayer at Via Etch causing Slow Down in Oxide Etch Rate
1996
Thuy Dao
Wei Wu
Keywords:
Oxide
Dry etching
Plasma processing
Reactive-ion etching
Plasma etcher
Etching (microfabrication)
Plasma etching
Materials science
Analytical chemistry
Silicon
Optoelectronics
Correction
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